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Item	Dimeter	Type/dopant	Orientaion	Coating	wavefront distortion	Parallelism	Reflectivity	dopant element concentration	Flatness	Surface/Roughness	Geometric parameter
GGG	25.4mm 50.8mm 76.5mm 100mm	Intrinsic	<100><110><111>	AR/HR/PR	≤0.15入/25mm	10 arc sec	1.95	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
(Nd:GGG)	25.4mm 50.8mm 76.5mm 100mm	Nd(钕)	<100><110><111>	AR/HR/PR	≤0.15入/25mm	10 arc sec	1.95	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
(Yb:GGG)	25.4mm 50.8mm 76.5mm 100mm	镱(Yb)	<100><110><111>	AR/HR/PR	≤0.15入/25mm	10 arc sec	1.95	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
YAG	25.4mm 50.8mm 76.5mm 100mm	Intrinsic	<100><110><111>	AR/HR/PR	≤0.125入/25mm	10 arc sec	1.82	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
(Nd:YAG )	25.4mm 50.8mm 76.5mm 100mm	Nd(钕)	<100><110><111>	AR/HR/PR	≤0.125入/25mm	10 arc sec	1.82	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
(Er:YAG )	25.4mm 50.8mm 76.5mm 100mm	Er	<100><110><111>	AR/HR/PR	≤0.125入/25mm	10 arc sec	1.82	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
(Yb:YAG )	25.4mm 50.8mm 76.5mm 100mm	镱(Yb)	<100><110><111>	AR/HR/PR	≤0.125入/25mm	10 arc sec	1.82	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
YVO4	25.4mm 50.8mm 76.5mm 100mm	Intrinsic	<100><110><111>	AR/HR/PR	≤0.25入/25mm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
(Nd:YVO4)	25.4mm 50.8mm 76.5mm 100mm	Nd(钕)	<100><110><111>	AR/HR/PR	≤0.25入/25mm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
(Er:YVO4)	25.4mm 50.8mm 76.5mm 100mm	Er	<100><110><111>	AR/HR/PR	≤0.25入/25mm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
(Yb:YVO4)	25.4mm 50.8mm 76.5mm 100mm	镱(Yb)	<100><110><111>	AR/HR/PR	≤0.25入/25mm	10 arc sec	2.5	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
磷酸钛氧钾(KTP)	25.4mm 50.8mm 76.5mm 100mm		X Y Z cut	AR/HR/PR	> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
KDP(KH2 PO4)	25.4mm 50.8mm 76.5mm 100mm		X Y Z cut	AR/HR/PR	> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
Lithium Triborate (LiB3O5 , LBO)	25.4mm 50.8mm 76.5mm 100mm		X Y Z cut	AR/HR/PR	> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
Beta-Barium Borate (β-BaB2O4,BBO)	25.4mm 50.8mm 76.5mm 100mm		X Y Z cut	AR/HR/PR	> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
BiB3O6 (BIBO)	25.4mm 50.8mm 76.5mm 100mm		X Y Z cut	AR/HR/PR	> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
BiB3O6 (BIBO)	25.4mm 50.8mm 76.5mm 100mm		X Y Z cut	AR/HR/PR	> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
钛宝石(Ti:sappire）红宝石(Cr:sappire	25.4mm 50.8mm 76.5mm 100mm	Ti/Cr	C A M cut	AR/HR/PR	> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
Yb:KGd(WO4)	25.4mm 50.8mm 76.5mm 100mm	镱(Yb)	X Y Z cut	AR/HR/PR	> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
Nd:KGd(WO4)	25.4mm 50.8mm 76.5mm 100mm	Nd(钕)	X Y Z cut	AR/HR/PR	> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
三硼酸锂（LBO）偏硼酸钡（BBO）	25.4mm 50.8mm 76.5mm 100mm		X Y Z cut	AR/HR/PR	> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
偏硼酸钡（BBO）	25.4mm 50.8mm 76.5mm 100mm		X Y Z cut	AR/HR/PR	> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
TSAG	25.4mm 50.8mm 76.5mm 100mm				> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
TGG(铽镓石榴石	25.4mm 50.8mm 76.5mm 100mm				> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

GGG

25.4mm 50.8mm 76.5mm 100mm

Intrinsic

<100><110><111>

AR/HR/PR

≤0.15入/25mm

10 arc sec

1.95

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

(Nd:GGG)

25.4mm 50.8mm 76.5mm 100mm

Nd(钕)

<100><110><111>

AR/HR/PR

≤0.15入/25mm

10 arc sec

1.95

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

(Yb:GGG)

25.4mm 50.8mm 76.5mm 100mm

镱(Yb)

<100><110><111>

AR/HR/PR

≤0.15入/25mm

10 arc sec

1.95

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

YAG

25.4mm 50.8mm 76.5mm 100mm

Intrinsic

<100><110><111>

AR/HR/PR

≤0.125入/25mm

10 arc sec

1.82

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

(Nd:YAG )

25.4mm 50.8mm 76.5mm 100mm

Nd(钕)

<100><110><111>

AR/HR/PR

≤0.125入/25mm

10 arc sec

1.82

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

(Er:YAG )

25.4mm 50.8mm 76.5mm 100mm

Er

<100><110><111>

AR/HR/PR

≤0.125入/25mm

10 arc sec

1.82

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

(Yb:YAG )

25.4mm 50.8mm 76.5mm 100mm

镱(Yb)

<100><110><111>

AR/HR/PR

≤0.125入/25mm

10 arc sec

1.82

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

YVO4

25.4mm 50.8mm 76.5mm 100mm

Intrinsic

<100><110><111>

AR/HR/PR

≤0.25入/25mm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

(Nd:YVO4)

25.4mm 50.8mm 76.5mm 100mm

Nd(钕)

<100><110><111>

AR/HR/PR

≤0.25入/25mm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

(Er:YVO4)

25.4mm 50.8mm 76.5mm 100mm

Er

<100><110><111>

AR/HR/PR

≤0.25入/25mm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

(Yb:YVO4)

25.4mm 50.8mm 76.5mm 100mm

镱(Yb)

<100><110><111>

AR/HR/PR

≤0.25入/25mm

10 arc sec

2.5

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

磷酸钛氧钾(KTP)

25.4mm 50.8mm 76.5mm 100mm

X Y Z cut

AR/HR/PR

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

KDP(KH2 PO4)

25.4mm 50.8mm 76.5mm 100mm

X Y Z cut

AR/HR/PR

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

Lithium Triborate (LiB3O5 , LBO)

25.4mm 50.8mm 76.5mm 100mm

X Y Z cut

AR/HR/PR

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

Beta-Barium Borate (β-BaB2O4,BBO)

25.4mm 50.8mm 76.5mm 100mm

X Y Z cut

AR/HR/PR

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

BiB3O6 (BIBO)

25.4mm 50.8mm 76.5mm 100mm

X Y Z cut

AR/HR/PR

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

BiB3O6 (BIBO)

25.4mm 50.8mm 76.5mm 100mm

X Y Z cut

AR/HR/PR

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

钛宝石(Ti:sappire）
红宝石(Cr:sappire

25.4mm 50.8mm 76.5mm 100mm

Ti/Cr

C A M cut

AR/HR/PR

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

Yb:KGd(WO4)

25.4mm 50.8mm 76.5mm 100mm

镱(Yb)

X Y Z cut

AR/HR/PR

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

Nd:KGd(WO4)

25.4mm 50.8mm 76.5mm 100mm

Nd(钕)

X Y Z cut

AR/HR/PR

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

三硼酸锂（LBO）偏硼酸钡（BBO）

25.4mm 50.8mm 76.5mm 100mm

X Y Z cut

AR/HR/PR

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

偏硼酸钡（BBO）

25.4mm 50.8mm 76.5mm 100mm

X Y Z cut

AR/HR/PR

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

TSAG

25.4mm 50.8mm 76.5mm 100mm

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

TGG(铽镓石榴石

25.4mm 50.8mm 76.5mm 100mm

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

(钆镓石榴石GGG) (钇铝石榴石YAG) 钒酸钇(YVO4) 钒酸钆（YVO4）磷酸氧钛钾（KTP）三硼酸锂（LBO）偏硼酸钡（BBO） KTP(磷酸氧钛钾)激光晶体 Wafer

Contact info

(钆镓石榴石GGG) (钇铝石榴石YAG) 钒酸钇(YVO4) 钒酸钆（YVO4）磷酸氧钛钾（KTP）三硼酸锂（LBO）偏硼酸钡（BBO） KTP(磷酸氧钛钾)激光晶体 Wafer

(钆镓石榴石GGG) (钇铝石榴石YAG) 钒酸钇(YVO4) 钒酸钆（YVO4） 磷酸氧钛钾（KTP） 三硼酸锂（LBO） 偏硼酸钡（BBO） KTP(磷酸氧钛钾)激光晶体 Wafer

Contact info

(钆镓石榴石GGG) (钇铝石榴石YAG) 钒酸钇(YVO4) 钒酸钆（YVO4） 磷酸氧钛钾（KTP） 三硼酸锂（LBO） 偏硼酸钡（BBO） KTP(磷酸氧钛钾)激光晶体 Wafer

(钆镓石榴石GGG) (钇铝石榴石YAG) 钒酸钇(YVO4) 钒酸钆（YVO4）磷酸氧钛钾（KTP）三硼酸锂（LBO）偏硼酸钡（BBO） KTP(磷酸氧钛钾)激光晶体 Wafer

(钆镓石榴石GGG) (钇铝石榴石YAG) 钒酸钇(YVO4) 钒酸钆（YVO4）磷酸氧钛钾（KTP）三硼酸锂（LBO）偏硼酸钡（BBO） KTP(磷酸氧钛钾)激光晶体 Wafer